>Characteristics:

1. Having the most modern processing technology, the research and development technology itself has sufficient precision to ensure its quality
2. The bottom layer is coated with a pure titanium layer, and there is a 120nm thick Au film on the surface, which can be called having a thick gold layer, not only can it be long
Stable storage and extremely good conductivity
3. It has a grid like bidirectional structure, similar to the primary copper mesh structure used in the early days, and is the only standard sample at home and abroad that can simultaneously inspect or correct the magnification of scanning electron microscopy and electron probe images in any two vertical directions
4. The measurement research report of the most authoritative metrological atomic force microscope in Germany's PTB International and the development report of the developer have been officially released (see the book "Discussion on Scanning Electron Microscopy Length Measurement Issues"), which adopts the most accurate and traceable detection method currently available, with reliable literature basis
5. S1000 has undergone multiple inspections and tests by the National Institute of Metrology in China and has obtained multiple certificates of conformity;
6. S1000 was approved by the relevant experts of the National Microbeam Standardization Committee as early as 2005, and has the qualification to apply for national standard samples. It has been used by many users for nearly ten years, proving its excellent quality
7. The published monograph "Discussion on Scanning Electron Microscopy Length Measurement" is actually a comprehensive research report on S1000; This is also the only type of standard sample in this category;
8. Low cost, easy to store, and easy to popularize in every scanning electron microscope and electron probe laboratory
9. Multi functional and versatile
(1) It can be used to simultaneously check or calibrate the magnification of scanning electron microscopy images in any two vertical directions. It is the most effective graphic standard sample for calibrating image magnification ranging from 10 × to 100000 × and above. It is an accurate calibration standard sample that follows GB/T27788 "Microbeam Analysis - Scanning Electron Microscopes - Image Magnification Calibration Guidelines"
(2) It can be directly used for precise comparison and measurement of lengths ranging from millimeter to nanometer scale objects of the same magnitude, and is an indispensable and accurate measurement tool for executing GB/T16594 and GB/T20307 micrometer and nanometer measurements
(3) It can be used to verify the distortion in the X and Y directions and edge distortion of images, and is an important tool for evaluating the quality of scanning electron microscopy images
(4) It also has a good effect on the inspection of sample table tilt angle, electronic tilt, and rotation adjustment function

(5) Using the "dot" image on the standard sample, drift testing and sample stage reset testing can be performed on the electron beam

Purpose:
(1) It can be used to simultaneously check or calibrate the magnification of scanning electron microscopy images in any two vertical directions, and is the most effective graphic standard sample for calibrating image magnification ranging from 10 × to 100000 ×
(2) It can be used to verify the distortion in the X and Y directions and edge distortion of images, and is an important tool for evaluating the quality of scanning electron microscopy images
(3) Can be directly used for accurate comparison and measurement of the length of objects of the same magnitude
(4) It also has a good effect on the inspection of sample table tilt angle, electronic tilt, and rotation adjustment function
(5) Using the "dot" image on the standard sample, drift testing and sample stage reset testing can be performed on the electron beam

Shape, specifications, and packaging of standard samples:
The S1000 micron to submicron series standard samples are generally small squares with a size of 5mm × 5mm and 0.5mm (length × width × thickness). The main figure is a "Hui" shaped box, with an outer frame length of about 2mm and an inner frame length of about 12mm. The inner frame is divided into four quadrants by X and Y axes, with short parallel lines with a line spacing of 20um perpendicular to the coordinate axis on the X and Y axes. The four quadrants are respectively a grid like shape with a line spacing of 40um, 20um, and 10um, and a bidirectional parallel line shape with a line spacing of 5um. The middle of the inner frame is a "Hui" shaped box, with a side length of about 160m for the large frame and about 50um for the small frame. There are parallel lines with a line spacing of 5um between the large and small frames in both the X and Y directions. Inside the small box are X with a line spacing of 1um or 05um The Y bidirectional parallel line graph (see Figure 1) has some cross shaped and circular dots on the line spacing structure of 5m, 1um, or 05um, which can be used for image aggregation and astigmatism adjustment under larger magnification. Different line spacing sizes can be used for calibration in the magnification range of 10 ×~10000. The design of the 40um, 20 μ m, and 10um line spacing structures in a grid shape is to accurately calibrate the magnification and verify the distortion, astigmatism, etc. of the image. The 5 μ m line spacing structure also has parallel lines in both X and Y directions, which is convenient for simultaneous magnification calibration in both X and Y directions without the need for mechanical rotation of the standard. The sentence is:.
Stability of standard samples:
The standard sample substrate material is a single crystal silicon or quartz glass substrate, with stable material properties. When observing the standard sample, it can be seen that the standard sample has good conductivity and the generated pattern under scanning electron microscopy has good contrast. After multiple long-term observations under scanning electron microscopy or optical microscopy, no deformation or other damage to the standard sample pattern or line spacing structure was observed, indicating that the standard sample is stable under repeated electron beam irradiation.